intel metal gate
12High-kandmetalgatetechnologyproposedbyIntel(productionyear:2007)[26].Sourcepublication.Fig.1.1ImagesofdifferentsemiconductorNWs.(a) ...,2007年12月24日—Intel和IBM兩家公司在2007年1月相繼發表了high-k/metalgate的實用化時程,兩家公司自2007下半年到20...
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Intelconsidershigh-kmetal-gatetobeincontinualdevelopment,with45nmnowwell-establishedinmanufacturing,with32nmonatwo-yearoffsetandjust ...
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